:::
C.M. Chang, S.F. Tseng, C.T. Lee, W.T. Hsiao, J. Andrew Yeh, D. Chiang*, “Dual photoresist complimentary lithography technique produces sub-micro patterns on sapphire substrates”, Journal of Micro/Nanolithography, MEMS, and MOEMS, 13(3), 033004 (2014). (S
回頁首
